Drop pattern generation for imprint lithography
作者： Jared L. Hodge , Philip D. Schumaker
DOI:
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摘要: Generating a fluid drop pattern for an imprint lithography process includes selecting imprinting surface with features and generating including locations placement of multiplicity drops substantially equal volume on substrate such that some the are aligned at least features. The is generated through optimization process. allows complete filling formation uniform residual layer during
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