作者: Ikuo Yoneda , Takuya Kono , Yasutada Nakagawa , Masayuki Hatano
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摘要: According to one embodiment, a fine processing method includes determining resist amount required for each first region of pattern formation surface and total resist. The include dividing the by volume drop determine drops number. provisional position assigning nearest drop, partitioning again into second regions assigned drop. divided value determined. finalizing final if distribution in falls within target range.