Fluid droplet methodology and apparatus for imprint lithography
作者： Edward Brian Fletcher , Zhengmao Ye
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摘要: A method can be used to generate a fluid droplet pattern for an imprint lithography process using dispense system having ports. The include determining first the formable material dispensed at preset minimum pitch or integer multiple thereof; second based on pattern, wherein is non-integer of pitch; adjusted speed substrate and ports relative each other pattern; moving speed; dispensing through frequency form substrate.
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