Development and Applications of UV Excimer Lamps

作者: Ulrich Kogelschatz , Ian W. Boyd , Jun-Ying Zhang

DOI: 10.1007/1-4020-2610-2_6

关键词:

摘要: The principles and properties of ultraviolet (UV) vacuum (VUV) radiation generated by decaying excimer complexes are discussed. Excimer lamps offer very high intensity (before saturation effects start to limit the spontaneous emission) narrow-band radiation, at various UV VUV wavelengths, highly efficient (with no self absorption), can provide photon fluxes over large areas. For large-scale industrial applications silent (dielectric-barrier) discharges using simple geometric configurations therefore possible. Applications these sources include photo-deposition area or patterned thin metal films, high-and low-dielectric-constant insulating layers, low-temperature oxidation Si, SiGe Ge, annealing, curing, cleaning, etching microstructuring surfaces, demonstrating that low cost systems an interesting alternative lasers for materials processing.

参考文章(126)
Jun-Ying Zhang, Gaelle Windall, Ian W. Boyd, UV curing of optical fibre coatings using excimer lamps Applied Surface Science. ,vol. 186, pp. 568- 572 ,(2002) , 10.1016/S0169-4332(01)00641-9
Never Kaliwoh, Jun-Ying Zhang, Ian W. Boyd, Titanium dioxide films prepared by photo-induced sol–gel processing using 172 nm excimer lamps Surface and Coatings Technology. ,vol. 125, pp. 424- 427 ,(2000) , 10.1016/S0257-8972(99)00617-9
V. Craciun, I. W. Boyd, A. H. Reader, W. J. Kersten, F. J. G. Hakkens, P. H. Oosting, D. E. W. Vandenhoudt, MICROSTRUCTURE OF OXIDIZED LAYERS FORMED BY THE LOW-TEMPERATURE ULTRAVIOLET-ASSISTED DRY OXIDATION OF STRAINED SI0.8GE0.2 LAYERS ON SI Journal of Applied Physics. ,vol. 75, pp. 1972- 1976 ,(1994) , 10.1063/1.356320
Prakash A. Murawala, Mikio Sawai, Toshiaki Tatsuta, Osamu Tsuji, Shizuo Fujita, Shigeo Fujita, Structural and Electrical Properties of Ta2O5Grown by the Plasma-Enhanced Liquid Source CVD Using Penta Ethoxy Tantalum Source Japanese Journal of Applied Physics. ,vol. 32, pp. 368- 375 ,(1993) , 10.1143/JJAP.32.368
Yukio Nishimura, Kyoji Tokunaga, Masaharu Tsuji, Deposition of tantalum oxide films by ArF excimer laser chemical vapour deposition Thin Solid Films. ,vol. 226, pp. 144- 148 ,(1993) , 10.1016/0040-6090(93)90220-J
S.C. Sun, T.F. Chen, Leakage current reduction in chemical-vapor-deposited Ta 2 O 5 films by rapid thermal annealing in N 2 O IEEE Electron Device Letters. ,vol. 17, pp. 355- 357 ,(1996) , 10.1109/55.506365
U. Kogelschatz, Silent discharges for the generation of ultraviolet and vacuum ultraviolet excimer radiation Pure and Applied Chemistry. ,vol. 62, pp. 1667- 1674 ,(1990) , 10.1351/PAC199062091667
Jun-Ying Zhang, I.W. Boyd, Low temperature photo-oxidation of silicon using deep UV radiation Electronics Letters. ,vol. 32, pp. 2097- 2098 ,(1996) , 10.1049/EL:19961377
Satoshi Kamiyama, Pierre‐Yves Lesaicherre, Hiroshi Suzuki, Akira Sakai, Iwao Nishiyama, Akiniko Ishitani, Ultrathin Tantalum Oxide Capacitor Dielectric Layers Fabricated Using Rapid Thermal Nitridation prior to Low Pressure Chemical Vapor Deposition Journal of The Electrochemical Society. ,vol. 140, pp. 1617- 1625 ,(1993) , 10.1149/1.2221612
B. Eliasson, U. Kogelschatz, Modeling and applications of silent discharge plasmas IEEE Transactions on Plasma Science. ,vol. 19, pp. 309- 323 ,(1991) , 10.1109/27.106829