作者: Ulrich Kogelschatz , Ian W. Boyd , Jun-Ying Zhang
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摘要: The principles and properties of ultraviolet (UV) vacuum (VUV) radiation generated by decaying excimer complexes are discussed. Excimer lamps offer very high intensity (before saturation effects start to limit the spontaneous emission) narrow-band radiation, at various UV VUV wavelengths, highly efficient (with no self absorption), can provide photon fluxes over large areas. For large-scale industrial applications silent (dielectric-barrier) discharges using simple geometric configurations therefore possible. Applications these sources include photo-deposition area or patterned thin metal films, high-and low-dielectric-constant insulating layers, low-temperature oxidation Si, SiGe Ge, annealing, curing, cleaning, etching microstructuring surfaces, demonstrating that low cost systems an interesting alternative lasers for materials processing.