作者: R. M. Langford , T.-X. Wang , M. Thornton , A. Heidelberg , J. G. Sheridan
DOI: 10.1116/1.2348731
关键词:
摘要: A comparison of four different methods to make electrical contact both 100nm gold nanowires and 50nm multiwall carbon nanotubes is given. The techniques are compared in terms the success yield, resistance, complexity fabrication steps, potential for creating novel device structures architectures. (i) situ micromanipulation wires onto prepatterned electrodes, (ii) ion electron beam assisted deposition, (iii) lithography, (iv) drop casting from solution electrodes.