Low temperature electron microscopy on the cubic-tetragonal transformation of V3Si
作者： T. Onozuka , N. Ohnishi , M. Hirabayashi
DOI: 10.1007/BF02628360
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摘要: The cubic-tetragonal martensitic transition of V3Si and its precursor have been investigated in the temperature range from 13 K to 80 using a 1 MV electron microscope with double-tilting cold stage. Below Tm = 19 K, fine twin lamellae appear parallel {110} plane traces, being connected continuously mottled striations having same orientation. Fine along traces or so-called tweeds are observed below 50 at structural phase transition. image contrast tweed patterns is attributed presence lattice distortion owing softening shear modulus. Reversible changes recorded TV-VTR system during cooling heating processes were discussed briefly.
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