Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films
作者： N. I. Fainer , A. G. Plekhanov , A. N. Golubenko , Yu. M. Rumyantsev , E. A. Maksimovskii
DOI: 10.1134/S0022476617010188
关键词:
摘要: Based on thermodynamic simulation the deposition of condensed phases with complex composition in Si–C–N–O–H system a wide temperature range, using initial gas mixtures 1,1,3,3-tetramethyldisilazane (HSi(CH3)2)2NH (TMDS), TMDS variable mixture oxygen and nitrogen (O2+xN2), method is developed to obtain SiCxNyOz:H nanocomposite films by plasma chemical decomposition this range 373-973 K. By FTIR energy dispersive X-ray spectroscopy structure bonds elemental obtained silicon oxycarbonitride are studied. The situ phase PECVD processes examined optical emission spectroscopy.
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