Method of manufacturing super-conductive tunnel junction devices with precise junction area control
作者： Lawrence N. Smith
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摘要: Superconductive tunnel junctions are manufactured with precise junction areas by defining a narrow-line of width utilizing mask and thereafter applying second at an angle to the define area dimensions precisely controlled widths masks. "Edge lithography" is preferably utilized provide
lens.org 参考文章(3)
Horng-Sen Fu, Submicron patterning without using submicron lithographic technique ,(1980)
Francis M. Erdmann, Addison B. Jones, Process for in-situ formation of niobium-insulator-niobium Josephson tunnel junction devices ,(1982)
Harry Kroger, Superconductive tunnel junction device and method of manufacture ,(1980)