Porous Silicon: Volume-Specific Surface Area Determination from AFM Measurement Data

作者: Şafak Doğan , Nihan Akın , Ceren Başköse , Tarık Asar , Tofig Memmedli

DOI: 10.17265/2161-6221/2013.08.006

关键词:

摘要: Porous silicon layers manufactured by using (100), 1-5 ohm·cm p-type (boron doped) wafer electrochemical etching in HF etanol solution. Photoluminescence (PL) spectra of anodically etched obtained for different conditions studied and surface characteristics are investigated AFM. This study gives a simple way to determine specific porous which plays major role with porosity explaining the blue shift photoluminescence peak. Properties such as area, pore size, size distribution, main properties layer from AFM data important material many processing applications. The "specific area" (Sspecific) generally defined area solid per unit mass material, volume or cross section area. From 3-D reconstructions data, can be estimated directly volume-surface is calculated. For this feature total given m 2 /cm 3 . method not need construct special set up measurement non destructive.

参考文章(15)
Pushpendra Kumar, Peter Lemmens, Manash Ghosh, Frank Ludwig, Meinhard Schilling, Effect of HF concentration on physical and electronic properties of electrochemically formed nanoporous silicon Journal of Nanomaterials. ,vol. 2009, pp. 18- ,(2009) , 10.1155/2009/728957
Nathera Abass Ali Al-Temeeme, Ghaida Salman Muhammed, Study the Effect of Irradiation Time and HF Concentration on Porosity of Porous Silicon and Study Some of the Electrical Properties of Its Based Device Advances in Materials Physics and Chemistry. ,vol. 02, pp. 55- 58 ,(2012) , 10.4236/AMPC.2012.21009
P.M. Fauchet, L. Tsybeskov, C. Peng, S.P. Duttagupta, J. von Behren, Y. Kostoulas, J.M.V. Vandyshev, K.D. Hirschman, Light-emitting porous silicon: materials science, properties, and device applications IEEE Journal of Selected Topics in Quantum Electronics. ,vol. 1, pp. 1126- 1139 ,(1995) , 10.1109/2944.488691
Pushpendra Kumar, Patrick Huber, Effect of Etching Parameter on Pore Size and Porosity of Electrochemically Formed Nanoporous Silicon Journal of Nanomaterials. ,vol. 2007, pp. 1- 4 ,(2007) , 10.1155/2007/89718
Kasra Behzad, Wan Mahmood Mat Yunus, Zainal Abidin Talib, Azmi Zakaria, Afarin Bahrami, Esmaeil Shahriari, Effect of Etching Time on Optical and Thermal Properties of p-Type Porous Silicon Prepared by Electrical Anodisation Method Advances in Optical Technologies. ,vol. 2012, pp. 1- 9 ,(2012) , 10.1155/2012/581743
Hsi-Ting Hou, Jia-Chuan Lin, Sin-Hong Liu, Meng-Kai Hsu, Improvement of Photoluminescence Uniformity of Porous Silicon by using Stirring Anodization Process World Academy of Science, Engineering and Technology, International Journal of Chemical, Molecular, Nuclear, Materials and Metallurgical Engineering. ,vol. 6, pp. 15- 18 ,(2012)
R. M. Tiggelaar, V. Verdoold, H. Eghbali, G. Desmet, J. G. E. Gardeniers, Characterization of porous silicon integrated in liquid chromatography chips Lab on a Chip. ,vol. 9, pp. 456- 463 ,(2009) , 10.1039/B812301B
Elke AF Van Doren, Pieter-Jan RH De Temmerman, Michel Francisco, Jan Mast, Determination of the volume-specific surface area by using transmission electron tomography for characterization and definition of nanomaterials. Journal of Nanobiotechnology. ,vol. 9, pp. 17- 17 ,(2011) , 10.1186/1477-3155-9-17
A. Uhlir, Electrolytic Shaping of Germanium and Silicon Bell System Technical Journal. ,vol. 35, pp. 333- 347 ,(1956) , 10.1002/J.1538-7305.1956.TB02385.X