Method and system for interference lithography utilizing phase-locked scanning beams

摘要: A method and system of interference lithography (also known as interferometric or holographic lithography) which utilizes phase-locked, scanning beams (so-called beam lithography, SBIL). The invention a high-precision stage that moves substrate under overlapped interfering pairs coherent beams. interfere, generating fringes, form pattern “brush” for subsequent writing periodic quasi-periodic patterns on the substrate. phase fringes in region is phase-locked to motion precision stage. includes methods forming, overlapping, phase-locking variety substrates; measuring controlling period, phase, angular orientation generated by overlapping beams; effects mechanical thermal drift other disturbances during process.