作者: M. Popall , A. Dabek , M.E. Robertsson , G. Gustafsson , O.-J. Hagel
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摘要: Hybrid inorganic-organic polymers (ORMOCERs) have been developed and tested in an ongoing EU-program (BE 7250 DONDOMCM) for evaluation MCM applications. The photopatternable materials with negative resist behavior are composed of inorganic oxidic structures cross-linked or substituted by organic groups. They prepared from organosilane precursors sol-gel-processing combination crosslinking polymerizable functions. As a result these functionalities the properties ORMOCERs can be adjusted to particular Systematic variation composition combined adaptation micro system technology allows great flexibility processing. Some features are: postbaking at moderate temperatures (120/spl deg/C-180/spl deg/C) enables processing on substrates such as FR-4 BT. Combined use dielectric passivation layers electrical systems devices well core cladding optical applications e/o high integration levels. Easily adaptable thin film technology: spin-on planarization >90% via diameters down 20 /spl mu/m achieved.