Wafer based mask characterization for double patterning lithography
作者： Robert de Kruif , Karsten Bubke , Gert-Jan Janssen , Eddy van der Heijden , Jörg Fochler
DOI: 10.1117/12.798515
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摘要: … We will show that the reticle to reticle overlay contribution on the wafer is smaller … reticle data, study the correlation and show that reticle to reticle overlay contribution based single mask …
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