Routing system and method for double patterning technology
作者： Yuan-Te Hou , Wen-Ju Yang , Huang-Yu Chen , Lee-Chung Lu , Gwan Sin Chang
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摘要: A method includes receiving an identification of a plurality circuit components to be included in IC layout. Data are generated representing first pattern connect two the components. The has segments. At least segments have lengthwise directions perpendicular each other. one pattern-free region is reserved adjacent at or more additional patterns near pattern. None formed region. and form double-patterning compliant set patterns. output machine readable storage medium read by system for controlling process fabricate pair masks patterning semiconductor substrate using double technology.
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