Silicon Oxycarbide Thin Films by Remote Microwave Hydrogen Plasma CVD Using a Tetramethyldisiloxane Precursor
作者： Aleksander M. Wrobel , Pawel Uznanski , Agnieszka Walkiewicz-Pietrzykowska , Bartosz Glebocki , Ewa Bryszewska
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sci-hub.se 参考文章(26)
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