Single-crystal Ti2AlN thin films
作者： T. Joelsson , A. Hörling , J. Birch , L. Hultman
DOI: 10.1063/1.1882752
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摘要: We have produced pure thin-film single-crystal Ti2AlN(0001), a member of the Mn+1AXn class materials. The method used was UHV dc reactive magnetron sputtering from 2Ti:Al compound target in mixed Ar–N2 discharge onto (111) oriented MgO substrates. X-ray diffraction and transmission electron microscopy were to establish hexagonal crystal structure with c lattice parameters 13.6 3.07A, respectively. hardness H, elastic modulus E, as determined by nanoindentation measurements, found be 16.1±1GPa 270±20GPa, A room-temperature resistivity for films 39μΩcm obtained.
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