A critical examination of 3D stackable NAND Flash memory architectures by simulation study of the scaling capability

作者: Yi-Hsuan Hsiao , Hang-Ting Lue , Tzu-Hsuan Hsu , Kuang-Yeu Hsieh , Chih-Yuan Lu

DOI: 10.1109/IMW.2010.5488390

关键词:

摘要: Various 3D NAND Flash array architectures including P-BiCS, TCAT, VSAT, and VG are critically examined in this work by extensive TCAD simulations. All structures have X,Y lateral scaling limitation since the minimal ONO thickness (∼20 nm) poly channel (∼10nm) can not be scaled further. Among them may best X-direction scalability to F∼2X nm node, no penalty of increasing Z layer number current flows horizontally. We propose a buried-channel junction-free improve read for all arrays our simulation results well support structure. For first time, “Z-interference” is it indicates new Z-direction limitation. The present crucial importance understanding various approaches.

参考文章(1)
Tzu-Hsuan Hsu, Hang-Ting Lue, Ya-Chin King, Yi-Hsuan Hsiao, Sheng-Chih Lai, Kuang-Yeu Hsieh, Rich Liu, Chih-Yuan Lu, Physical Model of Field Enhancement and Edge Effects of FinFET Charge-Trapping NAND Flash Devices IEEE Transactions on Electron Devices. ,vol. 56, pp. 1235- 1242 ,(2009) , 10.1109/TED.2009.2018713