作者: Christopher D. Hruska
DOI:
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摘要: A plasma gate device comprises a housing, gas inlet, first and second dielectrics, first, second, third electrodes. The housing includes an internal reactor chamber. inlet receives source that flows to the dielectrics are spaced apart from one another, with each dielectric including upper surface lower surface. two oriented such of faces dielectric. form boundaries electrode electric voltage. voltages in combination generate field chamber through which creating positive ion cloud electrons. attracts