Enhanced adhesion of copper to dielectrics via titanium and chromium additions and sacrificial reactions

作者: S.W. Russell , S.A. Rafalski , R.L. Spreitzer , J. Li , M. Moinpour

DOI: 10.1016/0040-6090(94)05812-1

关键词:

摘要: … In the Cu(Ti) and Cu(Cr) alloy systems the force increases with temperature with less systematic difference among the three substrates. These results correlate well with tape testing. Ti …

参考文章(43)
S. W. Russell, T. L Alford, J. W. Mayer, Dealloying Kinetics of Cu1 − x Ti x on SiO2 Using In Situ X‐Ray Diffraction Journal of The Electrochemical Society. ,vol. 142, pp. 1308- 1317 ,(1995) , 10.1149/1.2044169
Y. Shacham‐Diamand, A. Dedhia, D. Hoffstetter, W. G. Oldham, Copper transport in thermal SiO2 Journal of The Electrochemical Society. ,vol. 140, pp. 2427- 2432 ,(1993) , 10.1149/1.2220837
C. Apblett, P. J. Ficalora, Stress generation in thin Cu‐Ti films in vacuum and hydrogen Journal of Applied Physics. ,vol. 69, pp. 4431- 4432 ,(1991) , 10.1063/1.348370
C. Apblett, D. Muira, M. Sullivan, P. J. Ficalora, Reaction of Cu‐Ti bilayer films in vacuum and hydrogen Journal of Applied Physics. ,vol. 71, pp. 4925- 4932 ,(1992) , 10.1063/1.350641
C. Cabral, J. M. E. Harper, K. Holloway, D. A. Smith, R. G. Schad, Preparation of low resistivity Cu–1 at. %Cr thin films by magnetron sputtering Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 10, pp. 1706- 1712 ,(1992) , 10.1116/1.577774
Nadhira Laidani, Antonio Miotello, Luis Guzman, Stefano Tuccio, Lucia Calliari, Nitrogen‐implantation induced enhanced adhesion of amorphous SiC films deposited on stainless steel and Cu Journal of Applied Physics. ,vol. 76, pp. 285- 294 ,(1994) , 10.1063/1.357142
Do‐Heyoung Kim, Robert H. Wentorf, William N. Gill, Nucleation of copper on TiW and TiN during chemical vapor deposition Journal of Applied Physics. ,vol. 74, pp. 5164- 5166 ,(1993) , 10.1063/1.354280
M. Kottke, Ti/borophosphosilicate glass interfacial reactions and their effects on adhesion Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 10, pp. 1124- 1132 ,(1992) , 10.1116/1.586088
J. Valli, A review of adhesion test methods for thin hard coatings Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 4, pp. 3007- 3014 ,(1986) , 10.1116/1.573616
Hitoshi Itow, Yasushi Nakasaki, Gaku Minamihaba, Kyoichi Suguro, Haruo Okano, Self‐aligned passivation on copper interconnection durability against oxidizing ambient annealing Applied Physics Letters. ,vol. 63, pp. 934- 936 ,(1993) , 10.1063/1.109849