Interdiffusion and Reaction Between Al and Zr in the Temperature Range of 425 to 475 °C

作者: Abhishek Mehta , Judith Dickson , Ryan Newell , Dennis D. Keiser , Yongho Sohn

DOI: 10.1007/S11669-019-00729-9

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摘要: Interdiffusion and reaction between Al Zr was investigated as functions of purity, temperature, time, using versus solid-to-solid diffusion couple annealed in the temperature range from 425 °C to 475 °C. All couples were observed develop two intermetallic layers, i.e., Al3Zr Al2Zr. The phase grew with planar morphology, while Al2Zr developed a non-planar interfacial morphology. Growth rate integrated interdiffusion coefficients determined Wagner’s approach for each phase. Purity had significant effect on development phases. Diffusion low-purity (i.e., 99.2%) exhibited higher growth Al3Zr, at expense growth. Couples low purity also resulted degree non-planarity In general, increased an increase anneal it decreased temperature. Non-planar morphology simulated based 3-D anisotropic diffusivity tensor (quadric), needle-like growth, similar that by experiments simulated.

参考文章(45)
D. Borivent, B. Billia, J. Paret, Anomalous growth of Ni3Si2 in bulk Ni/Si interdiffusion Journal of Applied Physics. ,vol. 104, pp. 013523- ,(2008) , 10.1063/1.2946721
John Freserick Nye, Physical properties of crystals ,(1985)
JH Jan Gülpen, Reactive phase formation in the Ni-Si system Technische Universiteit Eindhoven. ,(1995)
AA Alexander Kodentsov, JH Jan Gülpen, van Fjj Frans Loo, Growth of silicides in Ni-Si and Ni-SiC bulk diffusion couples Zeitschrift Fur Metallkunde. ,vol. 86, pp. 530- 539 ,(1995) , 10.1515/IJMR-1995-860803
S. Bhagavantam, P. V. Pantulu, Generalized symmetry and Neumann’s principle Proceedings of the Indian Academy of Sciences - Section A. ,vol. 66, pp. 33- 39 ,(1967) , 10.1007/BF03049406
Derek K. Jones, Gaussian Modeling of the Diffusion Signal Diffusion MRI. pp. 37- 54 ,(2009) , 10.1016/B978-0-12-374709-9.00003-1
P. C. Tortorici, M. A. Dayananda, Growth of silicides and interdiffusion in the Mo-Si system Metallurgical and Materials Transactions A-physical Metallurgy and Materials Science. ,vol. 30, pp. 545- 550 ,(1999) , 10.1007/S11661-999-0046-4
Keith E. Knipling, David C. Dunand, David N. Seidman, Precipitation evolution in Al-Zr and Al-Zr-Ti alloys during isothermal aging at 375-425 °C Acta Materialia. ,vol. 56, pp. 114- 127 ,(2008) , 10.1016/J.ACTAMAT.2007.09.004
K. N. Tu, G. Ottaviani, U. Gösele, H. Föll, Intermetallic compound formation in thin‐film and in bulk samples of the Ni‐Si binary system Journal of Applied Physics. ,vol. 54, pp. 758- 763 ,(1983) , 10.1063/1.332034