Pattern generator mirror configurations

摘要: The present invention relates to an apparatus for creating a pattern on workpiece sensitive radiation, such as photomask display panel or microoptical device. comprises source emitting electromagnetic spatial modulator having multitude of modulating elements (pixels), adapted being illuminated by said and projection system image the workpiece. It further electronic data processing delivery receiving digital description be written, extracting from it sequence partial patterns, converting patterns signals, feeding signals modulator, precision mechanical moving and/or relative each other control coordinating movement workpiece, intensity so that is stitched together images created patterns. According drive can set element number states larger than two.