Improved pattern generator
作者： Torbjörn Sandström
DOI:
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摘要: The present invention relates to an apparatus for creating a pattern on workpiece sensitive radiation, such as photomask, display panel or microoptical device. comprises radiation source and spatial modulator (SLM) having multitude of modulating elements (pixels). It further electronic data processing delivery system feeding drive signals the modulator, precision mechanical moving said control coordinating movement workpiece, intensity so that is stitched together from partial images created by sequence patterns. According can set element number states larger than two.
lens.org 参考文章(15)
Torbjorn Sandstrom, Method for pattern generation with improved image quality ,(1999)
David A. Markle, Natale M. Ceglio, Maskless, reticle-free, lithography ,(1996)
Jeffrey M Hoffman, Thomas J. Dunn, Kanti Jain, Seamless, maskless lithography system using spatial light modulator ,(1996)
Tsen-Hwang Lin, Jay M. Brown, Shane R. Palmer, Steven C. Gustafson, Method of exposing a light sensitive material ,(1995)
Masaru Saeki, 優 佐伯, Exposure method and manufacture of semiconductor device ,(1997)
Kaoru Koike, 薫 小池, Exposure pattern projection device and aligner ,(1997)
恵子 矢野, Keiko Yano, Electron beam exposure method ,(1991)
Yukio Tomizawa, 幸雄 富沢, Exposing method and exposing device ,(1996)
薫 小池, Kaoru Koike, Deformable illumination filter and semiconductor aligner ,(1997)
Minoru Yoshii, Kyoichi Miyazaki, Seiji Takeuchi, 誠二 竹内, 恭一 宮▲崎▼, Masanori Hasegawa, 雅宣 長谷川, 実 吉井, Aligner and device, and manufacturing method using it ,(1995)