Exposing method and exposing device

摘要: PROBLEM TO BE SOLVED: To provide an exposing method and device improving uniformity of pattern a manufactured optical disk master without generating error between desired beam power actual at the time. SOLUTION: Driving voltage setting value efficiency are calculated in order to make relationship driving (b) (c) linear range power. Based on this value, is impressed modulator 2, based efficiency, emitted from 2 adjusted by adjusting means 4, disk, etc., exposed (e).