Vapor phase modification of sol–gel derived titania (TiO2) surfaces
作者： Ireneusz Piwoński , Aneta Ilik
DOI: 10.1016/J.APSUSC.2006.05.114
关键词:
摘要: Abstract Chemical vapor deposition (CVD) method was used in titania surface modification. Titania layers were obtained sol–gel process and prepared as thin films on silicon wafers dip-coating method. In order to define the influence of modification properties (e.g., friction), various types fluoroalkylsilanes used. The effectiveness monitored by FT-IR spectroscopy. topography frictional measurements investigated with use atomic force microscopy (AFM).
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