作者: N. N. Salashchenko , N. I. Chkhalo , E. B. Klyuenkov , V. N. Polkovnikov
DOI: 10.1007/S11954-008-2013-4
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摘要: The state of art in the field precise shape correction mirrors for objectives projection lithographic systems with an operating wavelength 13.5 nm at Institute Physics Microstructures, Russian Academy Sciences is reported. main problems and nearest prospects are discussed. A new scheme a interferometer two low-coherent spherical wave sources proposed.