作者: Chen Jinlai , Li Mingyuan , Chen Yingchun
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摘要: The present invention relates to high vacuum electron beam purification system for producing semiconductor purity grade raw material, it is characterized in that: furnace set superhigh chamber, using precision computer control the electric gun emit power density stream proceed indirect heating of material be purifiedin furnace, cause metal or nonmetal impurity reach vaporization temperature and vaporized, so as obtain material.