Electron beam conditioning
作者： Collin Chan , Kensuke Uemura , Purwadi Raharjo , Simon R. Lancaster-Larocque
DOI:
关键词:
摘要: The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that maintaining a footprint the beam incident workpiece within defined energy level. Such configuration allows heat only specific portions superheated state in which intermetallic compounds dissolved. In one embodiment mask is prevents low from contacting workpiece. another can be focused way maintains at level such substantially all above threshold
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