W Swiech, G.H Fecher, Ch Ziethen, O Schmidt, G Schönhense, K Grzelakowski, C M. Schneider, R Frömter, H.P Oepen, J Kirschner,
Recent progress in photoemission microscopy with emphasis on chemical and magnetic sensitivity Journal of Electron Spectroscopy and Related Phenomena. ,vol. 84, pp. 171- 188 ,(1997) ,
10.1016/S0368-2048(97)00022-4