Device and method for nano-imprinting full wafer

摘要: A device and method for nano-imprinting a full wafer is disclosed. The includes workbench (1), (2) coated with resist, nozzles de-molding (3), template (4), an imprinting head (5), pressure pipelines (6), vacuum (7) UV light source (8), wherein the (4) fixed at bottom of (5) (3) are provided lower sides (4). (6) connected air inlets two stage. resist on (1). (8) arranged above (5). includes: 1) pretreatment process; 2) 3) solidification 4) process. has advantages simple structure, low cost, high production rate, precision large area. adapted to mass manufacture uneven wafers. can be used density disks, micro optic components micro-fluidic components, especially patterning wafers photonic crystal LEDs.