C 2 F 6 reactive ion-beam etching of LiNbO 3 and Nb 2 O 5 and their application to optical waveguides
作者： Bei Zhang , S. Forouhar , S. Huang , W. Chang
关键词:
摘要: Properties of C 2 F 6 (freon 116) reactive ion-beam etching (RIBE) LiNbO 3 , Ti-indiffused and sputter-deposited Nb O 5 film on are reported. A maximum differential ratio approximately 5:1 has been measured for the AZ 1350B Shipley photoresist. We have used this technique to fabricate diffraction gratings both - waveguides with throughput efficiencies in excess 85 percent.
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