Reactive gas, reactive gas generation system and product treatment using reactive gas

作者: Mark A. Hochwalt , Kevin M. Keener

DOI:

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摘要: A method of treating a product or surface with reactive gas, comprises producing the gas by forming high-voltage cold plasma (HVCP) from working gas; transporting at least 5 cm away HVCP; followed contacting gas. The HVCP does not contact surface.

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