Temperature controlling apparatus and method for forming coating layer

作者: Cheng Wei-Chang , Liao Chi-Hung

DOI:

关键词:

摘要: A temperature controlling apparatus includes a platen, fluid source, chiller, first conduit and second conduit. The source supplies fluid. chiller is coupled to the cool in cooling temperature. inlet communication with outlet heater that heats from heating heated by dispensed on platen through outlet. different

参考文章(6)
Wang-Sheng Chen, Tseng-Kuei Tseng, Photoresist coating system ,(2004)
Kun-tack Lee, Young-Hoo Kim, Seung-Yul Park, Yong-Bum Kwon, Apparatus For Drying Substrate ,(2011)
Hsueh-Chin Lu, Weibo Yu, Kuo Bin Huang, Chao-Cheng Chen, Han-Guan Chew, Syun-Ming Jang, Silicon nitride etching in a single wafer apparatus ,(2011)
Anders Joel Bjoerk, Philipp Engesser, David Henriks, Process and apparatus for treating surfaces of wafer-shaped articles ,(2013)
Anchel Sheyner, James P. Cruse, Martin Jeff Salinas, Jared Ahmad Lee, Corie Lynn Cobb, John W. Lane, Ming Xu, Evans Lee, Ezra Robert Gold, Andrew Nguyen, Twin chamber processing system ,(2010)