Thin film deposition method and resulting product
作者： Vincent Reymond , Andriy Kharchenko , Nicolas Nadaud
DOI:
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摘要: The invention relates to a method for obtaining substrate coated on at least one face thereof with low-emittance stack of thin films, said comprising the following steps consisting in: depositing films including silver film between two dielectric films; and heat treating laser radiation emitted wavelength 500 2000 nm, such that emissivity and/or square resistance is reduced by 5 %. According invention, prior treatment, includes partially absorbs and, consequently, absorption 4 mm-thick clear glass this greater than or equal 10
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