作者: Akira Mitsui , Kunio Masumo
DOI: 10.1016/S0040-6090(03)00961-1
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摘要: Abstract ITO films deposited on ZrO 2 undercoats by sputtering were investigated. The have a fine grain structure, compared to grain–subgrain structure of conventional grown glass substrate. the consists 30–50 nm wide almost parallel-sided columns. surface grains good uniformity in shape and size. microstructure electrical properties changed with increasing thickness. This indicates that can be controlled film OLED fabricated worked lower driving voltage than one at same luminance.