Electric field influenced ZnO growth on nanoscale etched Si surface by continuous spray pyrolysis

摘要: This work reports ZnO growth by electric field influenced continuous spray pyrolysis reactor over seed layer assisted nanoscale etched Si surface. The comparative studies of in the presence and absence on anisotropically surface are supported XRD, SEM, EDX, FTIR reflectance measurements. XRD measurements confirm preferable (002) oriented certain amount etching which is reduced with further anisotropic etching. chlorine incorporation thin film measured EDX may be attributed to effect. present investigation show that etch pits energy profile has played an important role deciding nanorods alignment coalescence amongst species during self assembly at nucleation sites. It observed additional force droplets enhancing population density, homogeneous coverage for particular improved light coupling confirmed measurement. relevant mechanisms nanostructure layers comprising also discussed.