Device and method for cleaning and drying wafer cassettes

作者: Wu Lianghui

DOI:

关键词:

摘要: The invention discloses a device for cleaning and drying wafer cassettes. the cassettes comprises cavity, support frame used supporting plurality of cassettes, liquid spray pipe externally connected with source, discharging pipeline an air exhausting pipeline, wherein are respectively bottom arranged in cavity. further dry is method source provided, can not only drive away ultrapure water vapor but also suck all condensed comprehensive sufficient achieved.

参考文章(9)
David L. Halbmaier, Wafer container washing apparatus ,(2001)
Kert Dolechek, Jeffry Davis, Wafer container cleaning system ,(2002)
Kert Dolechek, Gordon Nelson, Ronald Breese, Centrifugal container cleaning system ,(2005)
Eric Bergman, Dana Scranton, Ronald Breese, C. Bryer, Apparatus and methods for removing metallic contamination from wafer containers ,(2002)
Jerry Norby, Dan Bexten, Method and apparatus for cleaning containers ,(2002)
Shigenori Hayashi, Masakazu Odaka, Toru Takayama, Takashi Inushima, Naoki Hirose, Method for forming a multi-layer planarization structure ,(1995)
Liu Guobing, He Guihu, Method for drying semiconductor wafer ,(2002)
Xiaohong Zhang, Yi Wu, Ruiting Wang, Hongyu Zhao, Single-wafer drying device and method ,(2012)
Mizuno Hiroki, Substrate processing apparatus ,(2007)