Method and apparatus for substrate rinsing and drying
作者： Michael A. Carcasi , Carlos A. Fonseca
DOI:
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摘要: A method and apparatus are disclosed for optimizing a rinsing drying process in semiconductor manufacturing. The optimization seeks to maximize processing throughput while maintaining low defect counts high device yields, utilizes simulation experimental data set the optimal parameters process. Improved methods of rinse liquid purge gas nozzle movement also disclosed.
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