作者: A. Jain , V. Gupta , S.N. Basu
DOI: 10.1016/J.ACTAMAT.2005.02.022
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摘要: … Silicon substrates of <1 0 0> orientation were chemically cleaned using the Piranha solution consisting of 5 parts sulfuric acid and 1 part hydrogen peroxide. The silicon wafers were …