Growth Kinetics and Properties of Thin Cobalt Films Electrodeposited on n-Si(100)
作者： Jong Duk Lee , Tae Hwan An , Hak Gi Noh , Sung Gon Kim , Young R. Choi
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摘要: The cobalt thin films were directly grown on n-Si(100) substrates in a non-aqueous electrolyte of 0.1 M CoCl2 by using pulsed electrodeposition technique. In this paper, the growth, structural and magnetic properties Co have been investigated. Current transient experiments showed that nuclei early deposition stage forms through three dimensional (3D) instantaneous nucleation followed diffusion-limited growth. From atomic force microscopy (AFM) analysis, it has found film surface consisted cubic distorted rectangular-shaped nanocrystallites with average size about 140 nm irrespective voltage. X-ray diffraction (XRD) measurement indicated was arranged only hexagonal close-packed (hcp) structure not involving face-centered (fcc) or silicide phases. Vibrating sample magnetometer (VSM) measurements revealed easy magnetization axis is parallel to plane.
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