Structural and Luminescent Properties of Sn-Doped SiO 2 Layers

作者: F. F. Komarov , L. A. Vlasukova , O. V. Milchanin , M. A. Makhavikou , I. N. Parkhomenko

DOI: 10.1007/S10812-014-9856-2

关键词:

摘要: The formation of tin nanocrystallites in a SiO2:Sn matrix using high-dose implantation technique followed by high-temperature processing was studied. Structural phase transformations were studied plan-view transmission electron microscopy. Optical properties the implanted samples investigated photoluminescence. It shown that annealing SiO2 layers formed nanoprecipitates β-Sn and caused appearance regions enriched SnO2. Photoluminescence spectra annealed exhibited intense emission photon energy range 1.3–3.6 eV attributed to oxygen-deficit centers created at nanocluster/SiO2 interface.

参考文章(21)
Milos Bohuslav Volf, Chemical Approach to Glass ,(1984)
AF Zatsepin, EA Buntov, VS Kortov, VA Pustovarov, H-J Fitting, B Schmidt, NV Gavrilov, None, Low-temperature photoluminescence of ion-implanted SiO2:Sn+ films and glasses Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. ,vol. 6, pp. 668- 672 ,(2012) , 10.1134/S1027451012080198
L. Rebohle, J. von Borany, H. Fröb, W. Skorupa, Blue photo- and electroluminescence of silicon dioxide layers ion-implanted with group IV elements Applied Physics B. ,vol. 71, pp. 131- 151 ,(2000) , 10.1007/PL00006966
Julian F. Bent, Alex C. Hannon, Diane Holland, Mustamam M.A. Karim, The structure of tin silicate glasses Journal of Non-crystalline Solids. ,vol. 232, pp. 300- 308 ,(1998) , 10.1016/S0022-3093(98)00388-3
Anri Nakajima, Hiroshi Nakao, Hiroaki Ueno, Toshiro Futatsugi, Naoki Yokoyama, Microstructure and electrical properties of Sb nanocrystals formed in thin, thermally grown SiO2 layers by low-energy ion implantation Journal of Vacuum Science & Technology B. ,vol. 17, pp. 1317- 1322 ,(1999) , 10.1116/1.590753
E. Kapetanakis, P. Normand, D. Tsoukalas, K. Beltsios, J. Stoemenos, S. Zhang, J. van den Berg, Charge storage and interface states effects in Si-nanocrystal memory obtained using low-energy Si+ implantation and annealing Applied Physics Letters. ,vol. 77, pp. 3450- 3452 ,(2000) , 10.1063/1.1328101
M.A. Tagliente, V. Bello, G. Pellegrini, G. Mattei, P. Mazzoldi, M. Massaro, D. Carbone, Synthesis and characterization of SnO2 nanoparticles embedded in silica by ion implantation Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms. ,vol. 268, pp. 3063- 3065 ,(2010) , 10.1016/J.NIMB.2010.05.042
W. Chen, Metal-based single electron transistors Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 15, pp. 1402- 1405 ,(1997) , 10.1116/1.589548
Nenad Lalic, Jan Linnros, Light emitting diode structure based on Si nanocrystals formed by implantation into thermal oxide Journal of Luminescence. ,vol. 80, pp. 263- 267 ,(1998) , 10.1016/S0022-2313(98)00109-4
M. A. Tagliente, V. Bello, G. Pellegrini, G. Mattei, P. Mazzoldi, M. Massaro, SnO2 nanoparticles embedded in silica by ion implantation followed by thermal oxidation Journal of Applied Physics. ,vol. 106, pp. 104304- ,(2009) , 10.1063/1.3257157