Reaction mechanisms of the radio frequency glow discharged deposition process in silane-helium
作者： G. Turban , Y. Catherine , B. Grolleau
DOI: 10.1016/0040-6090(79)90185-8
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摘要: Abstract The kinetics of a low pressure (0.2 Torr) r.f. discharge in SiH 4 -He has been studied. measured mass transport rate towards the wall is compared with derived from simplified mono-dimensional kinetic model. silane decomposition assumed to proceed mainly through electron impact, and only neutral radicals n have considered for diffusional transport. A good agreement found between experimental theoretical rates. measurement mean density means that an activation constant can be determined. species evolving plasma studied by spectrometry. formation disilane observed pressures above about 0.5 Torr.
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