Size effect on electronic sputtering of LiF thin films
作者： Manvendra Kumar , S. A. Khan , Parasmani Rajput , F. Singh , A. Tripathi
DOI: 10.1063/1.2794694
关键词:
摘要: Electronic sputtering in polycrystalline LiF thin film by 120MeV Ag25+ is investigated. The sputter yields of Li and F for the different thicknesses (10–265nm) films are measured with online elastic recoil detection analysis technique. A reduction yield, from ∼2.3×106 to 2.2×104 atoms/ion, observed increase thickness. trend experimental results can be explained terms size effect following inelastic thermal spike model. confinement energy having smaller grains lower thickness higher temperature causing yield.
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