Electronic sputtering from HOPG: A study of angular dependence
作者： A Tripathi , SA Khan , SK Srivastava , M Kumar , S Kumar
DOI: 10.1016/S0168-583X(03)01742-7
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摘要: The angular distribution of the sputtering yield from highly oriented pyrolytic graphite sample irradiated with a 130 MeV Ag beam is studied. was incident perpendicular to and sputtered carbon collected on Si catcher foils which were studied using high resolution ERDA set up. An anisotropic observed C ¼ A cos 1:3 H þ B expð�ð � 53Þ 2 =r ) shows that peak lies at around 53� otherwise over-cosine function. maximum , falling rapidly almost zero 90� an average sputter 5.5 · 10 5 atoms/ion. It suggested this
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