Rate Coefficient for Self-Association Reaction of CF2 Radicals Determined in the Afterglowof Low-Pressure C4F8 Plasmas
作者： C. Suzuki , K. Sasaki , K. Kadota
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摘要: We have analyzed decay kinetics of CF2 radicals in the afterglow low-pressure, high-density C4F8 plasmas. The curve density has been approximated by combination first- and second-order kinetics. surface loss probability evaluated from frequency first-order process on order 10−4. This small enabled us to observe process. mechanism is self-association reaction between (CF2+CF2→C2F4). rate coefficient for this as (2.6–5.3)×10−14 cm3/s under gas pressures 2 100 mTorr. was found be almost independent pressure close agreement with known values, which are determined high above 1 Torr.
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C. Suzuki, K. Sasaki, K. Kadota, Spatial and temporal variations of CF and CF2 radical densities in high-density CF4 plasmas studied by laser-induced fluorescence Journal of Applied Physics. ,vol. 82, pp. 5321- 5326 ,(1997) , 10.1063/1.366298
Chihiro Suzuki, Koichi Sasaki, Kiyoshi Kadota, Surface Kinetics of CFx Radicals and Fluorine Atoms in the Afterglow of High-Density C4F8 Plasmas Japanese Journal of Applied Physics. ,vol. 37, pp. 5763- 5766 ,(1998) , 10.1143/JJAP.37.5763
F. W. Dalby, Flash Photolysis Measurement of the Kinetics of CF2 Reactions The Journal of Chemical Physics. ,vol. 41, pp. 2297- 2303 ,(1964) , 10.1063/1.1726263
K. Sasaki, Y. Kawai, K. Kadota, Determination of fluorine atom density in reactive plasmas by vacuum ultraviolet absorption spectroscopy at 95.85 nm Review of Scientific Instruments. ,vol. 70, pp. 76- 81 ,(1999) , 10.1063/1.1149543
W. W. Stoffels, E. Stoffels, K. Tachibana, Polymerization of fluorocarbons in reactive ion etching plasmas Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 16, pp. 87- 95 ,(1998) , 10.1116/1.581016
G. Cunge, J. P. Booth, CF2 PRODUCTION AND LOSS MECHANISMS IN FLUOROCARBON DISCHARGES : FLUORINE-POOR CONDITIONS AND POLYMERIZATION Journal of Applied Physics. ,vol. 85, pp. 3952- 3959 ,(1999) , 10.1063/1.370296
Teiichiro Ogawa, Gary A. Carlson, George C. Pimentel, Reaction rate of trifluoromethyl radicals by rapid scan infrared spectroscopy The Journal of Physical Chemistry. ,vol. 74, pp. 2090- 2095 ,(1970) , 10.1021/J100909A007
P. B. Ayscough, Rate of Recombination of Radicals. II. The Rate of Recombination of Trifluoromethyl Radicals The Journal of Chemical Physics. ,vol. 24, pp. 944- 946 ,(1956) , 10.1063/1.1742720
Robert M. Robertson, David M. Golden, Michel J. Rossi, In situ radical detection under very low pressure photolysis conditions using resonance-enhanced multiphoton ionization. Kinetics of trifluoromethyl radicals produced from IR multiphoton dissociation of hexafluoroacetone The Journal of Physical Chemistry. ,vol. 92, pp. 5338- 5347 ,(1988) , 10.1021/J100330A006
P. J. Chantry, A simple formula for diffusion calculations involving wall reflection and low density Journal of Applied Physics. ,vol. 62, pp. 1141- 1148 ,(1987) , 10.1063/1.339662