Polymerization of fluorocarbons in reactive ion etching plasmas

作者: W. W. Stoffels , E. Stoffels , K. Tachibana

DOI: 10.1116/1.581016

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摘要: Polymerization reactions in radio frequency fluorocarbon plasmas of CF 4, C 2 F 6, and C 4 F 8 have been studied by electron attachment mass spectrometry (EAMS). In these plasmas polymerization occurs readily and molecules containing up to ten carbon atoms (the mass limit of the mass spectrometer) have been found. The densities of large polymers increase with increasing size of the parent gas. In a fluorine-rich environment like a CF 4 plasma the detected polymers are mainly fully saturated with F (C n F 2n+ 2). As the amount of fluorine …

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