Simulation of fluid flow in the step and flash imprint lithography process

摘要: Step and flash imprint lithography (SFIL) is a photolithography process in which the photoresist dispensed onto wafer its liquid monomer form then imprinted cured into desired pattern instead of using traditional optical systems. The mask used SFIL template features that made electron beam writing. Several variable sized drops are for imprinting. base layer thickness at end imprinting typically about 50nm, with an approximate area 1in^2. This disparate length scale allows simulation fluid movement between by solving governing equations mechanics simplified lubrication theory. Capillary forces also important factor movement; dimensionless capillary number describes relative importance these to viscous fluid. paper presents model flow coalescence multiple effect has on time. time shown decrease increasing numbers or applied force template. Appropriate filling issue SFIL, presented this study simulating interface around feature modified boundary condition equations. It found above critical aspect ratio, do not fill does spread outside edge. provides predictive tool understanding optimizing management SFIL.