作者: Takashi Sugino
DOI: 10.1116/1.589890
关键词:
摘要: Electron emission characteristics have been investigated for polycrystalline diamond films subjected to H2 plasma treatment, O2 and annealing. In the case of surface treatments film, voltage commencing electron increases due treatment or annealing is recovered by subsequent treatment. On other hand, in when rear face film treated with annealed diamond/Au samples, no recovery occurs after It suggested that there exists another factor dominating field characteristic than mechanisms such as injection at diamond/metal contact negative affinity.