Magnetron Sputtering of Polymeric Targets: From Thin Films to Heterogeneous Metal/Plasma Polymer Nanoparticles.

摘要: Magnetron sputtering is a well-known technique that commonly used for the deposition of thin compact films. However, as was shown in 1990s, when performed at pressures high enough to trigger volume nucleation/condensation supersaturated vapor generated by magnetron, various kinds nanoparticles may also be produced. This finding gave rise rapid development magnetron-based gas aggregation sources. Such systems were successfully production single material from metals, metal oxides, and plasma polymers. In addition, growing interest multi-component heterogeneous has led design novel gas-phase synthesis such nanomaterials, including metal/plasma polymer nanoparticles. this featured article, we briefly summarized principles basis highlighted recent progress made field fabrication We then introduced source utilized radio frequency magnetron polymeric target with an emphasis on key features kind source. Finally, presented discussed three strategies suitable generation multi-core@shell or core-satellite nanoparticles: use composite targets, multi-magnetron approach, in-flight coating metal.