Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymers.

摘要: The fabrication of many devices in modern technology requires techniques for growing thin films. As miniaturize, manufacturers will need to control film growth at the atomic level. Because have challenging morphologies, films must be able coat conformally on structures with high aspect ratios. Techniques based layer deposition (ALD), a special type chemical vapor deposition, allow ultra-thin and conformal inorganic materials using sequential, self-limiting reactions. Molecular (MLD) methods extend this strategy include organic hybrid organic−inorganic polymeric materials. In Account, we provide an overview surface chemistry MLD polymers examine variety strategies polymer Previously, such as polyamides polyimides has used two-step AB reaction cycle...