Effect of Cu content and ion beam bombardment on microstructure and mechanical properties of Cr–Cu–N films
作者： Linhai Tian , Yang Zhang , Yong Ma , Xiaodong Zhu , Bin Tang
DOI: 10.1016/J.SURFCOAT.2012.04.088
关键词:
摘要: Abstract Cr–Cu–N hard films were deposited on Si substrates using ion beam assisted magnetron sputtering (IBAMS). The effects of Cu content and bombardment energy the microstructure mechanical properties studied. results show that addition can restrict growth columnar grain to a certain degree. With increasing assisting from 400 eV 800 eV, finer denser grained Cr -Cu -N film be formed. XRD XPS analyses indicate under lower are composed CrN phases. However, only phase appears bombarding 800 eV. mainly exists with free state in films. has no obvious impact microhardness same 400 eV. fracture toughness improves content. Both significantly increase when increases It is attributed densification by bombardment. combining further toughness.
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