Model based insertion of assist features using pixel inversion method: implementation in 65nm node

作者: Chi-Yuan Hung , Qingwei Liu , Kyohei Sakajiri , Shumay D. Shang , Yuri Granik

DOI: 10.1117/12.681816

关键词:

摘要: Sub-resolution assist feature (SRAF) is widely used to improve lithographic performance. Rule-based SRAF insertion has been working well for one dimensional cases but becomes quite complex 2-dimensional arbitrary layout. In addition, the best rule generation involves a large amount of simulation and empirical data collection. Therefore model-based much more desirable especially 65nm node below. this work we use newly developed pixel inversion method true insertion. We'll extend our from contact layer lines spaces demonstrate capability all critical layers node. This will be in combination with OPC achieve required overlapping process window CD control. Furthermore, manufacture issues such as mask making time inspection examined reported.

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